Aaron David Boyajian
On the New York attorney register since 1999 · office in New York, NY
PlainAttorney’s reading of the public register file, not a court record.
- Registration No.
- 2964021
- Admitted
- 1999 · Second Department
- Status
- Currently registered
- Next registration
- Oct 2027
Aaron David Boyajian is currently registered on the New York attorney register file of Sep 29, 2026. Admitted in 1999 in the Second Department, with an office in New York, NY; next registration due Oct 2027. The status is the same in all 3 files we hold.
What this status means on the register
On the register, “Currently registered” means Aaron David Boyajian has filed the biennial registration the court system requires; the next one is due in Oct 2027.
- Currently registered unchanged
- Currently registered unchanged
- Currently registered the first file we hold
Source: NY Office of Court Administration, attorney registration file (data.ny.gov, dataset eqw2-r5nb), downloaded Sep 29, 2026; the Jul 3, 2026 and Aug 6, 2026 files for the history.
Others who list this employer on the register
27 other attorneys list Goetz Platzer LLP or one of its other names as their employer on the register; 13 of them were admitted before 1999, and all 28 give an office in New York, NY. The 5 whose admission is closest to 1999, earliest first:
| Attorney | Admitted | Status |
|---|---|---|
| Mitchell Lewis Kaplan | 1993 | Currently registered |
| Frederick Allen Friedman | 1998 | Currently registered |
| Alison Jaye Arden Besunder | 1999 | Currently registered |
| Teresa Giovanna Sadutto-Carley | 2003 | Currently registered |
| Gerard Schiano-Strain | 2003 | Currently registered |
Source: NY Office of Court Administration, attorney registration file (data.ny.gov, dataset eqw2-r5nb), downloaded Sep 29, 2026; employer spellings merged (methodology).
Where this record sits on the register
Aaron David Boyajian studied at Maurice A. Deane School of Law at Hofstra University (the register spells it “HOFSTRA”). 2,255 of its 11,234 living graduates on the register were admitted in the 1990s, as Aaron David Boyajian was.
- Same law school
- 11,234living graduates; 92.1% registered (current or due), against 87.1% overall
- Office in New York, NY
- 93,604living registrants
Of the 93,604 living registrants with an office in New York, NY, 26,158 were admitted before 1999 and 65,724 after.
Source: NY Office of Court Administration, attorney registration file (data.ny.gov, dataset eqw2-r5nb), downloaded Sep 29, 2026; living registrants only.
Questions this record leads to
- Everyone who lists Goetz Platzer LLP28 on the register, 13 of the others admitted before 1999; all 28 give an office in New York, NY.
- Maurice A. Deane School of Law at Hofstra University graduates on the register11,234 living, 92.1% registered.
- Attorneys with an office in New York, NY93,604 living registrants give an office there.
- New York County’s registered bar75,989 currently registered, 46.63 per 1,000 residents.
- Admitted in 19997,628 people admitted in 1999 are on the register, 2,434 of them through the Second Department.
- Every registration that reads “Currently registered”286,911 on the register file of Sep 29, 2026, by decade of admission.
- What a New York lawyer may chargeThe court rules on fees, retainers and fee disputes, each cited.
How to confirm it officially
For a statement of Aaron David Boyajian’s standing, contact the Attorney Registration Unit of the NY Office of Court Administration (nycourts.gov/attorneys), or ask the Appellate Division, Second Department, which admitted Aaron David Boyajian in 1999. A complaint about this attorney would go to the First Department’s grievance committee, which covers New York County, where the register places the office.
This page reads the register file of Sep 29, 2026, and the court system’s own search can be newer; the register shows only the current value, so a suspension that ended before the files we hold, or a censure, leaves no trace here (Appellate Division decisions are published through the court system’s Law Reporting Bureau).