New York attorney record · Judicial Dept 2

Andrew Lewis Aaron

Hofstra University Maurice A. Deane School Of Law alumna, admitted to the New York bar in 1987, registered office in Port Washington, NY. Decades of status, address, and registration history on this record come straight from the NY Office of Court Administration.

1987
Admitted
39
Years in bar
2091106
NY reg #

The record in one line

With 39 years on the register since a 1987 admission, Andrew Lewis Aaron ranks among the New York bar's most senior active practitioners, longer-tenured than 79% of the currently-active bar.

39 yrs
in active practice since admission
Active
current bar status: "Currently registered"
Top 21%
by tenure among active NY attorneys
Law school
Hofstra University Maurice A. Deane School Of Law

Data updated May 2026

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Bar status
Currently registered
active
Current registration status per NY Office of Court Administration
Year admitted
1987
39 years
Year of first admission to the New York bar
Law school
Hofstra University Maurice A. Deane School Of Law
86.1% active rate
Law school attended, with active-bar rate where available
Registration
2091106
NY registration #
Official NY OCA attorney registration number

What this profile tells you

Bar status & tenure

Registration 2091106 with the New York bar authority has long belonged to Andrew Lewis Aaron, a veteran practitioner still in active good standing. Registration is recorded within Judicial Department 2, the appellate division overseeing this attorney's home district.

Practice context & education

Practice address is listed under Andrew L. Aaron, P.C., located in Port Washington, NY (Nassau County), ZIP 11050. Educational background: Hofstra University Maurice A. Deane School of Law (4,142 registered alumni).

State context & due diligence

After 39 years on the register, Andrew Lewis Aaron still falls within the New York bar's active cohort, a share of the register detailed further below.

Experience vs. the active New York bar

Few active New York attorneys match Andrew Lewis Aaron's 39 years since admission in 1987. The histogram plots that tenure against every currently-active attorney in the state.

39 years on the New York bar

Years since admission, all currently-active NY attorneys

39 Top 21% higher than 79% of 284,296 active NY attorneys

This attorney 0 80 every active NY attorney, bucketed by value

Each bar is a band; taller bars hold more active NY attorneys. The dashed line + filled bar mark this entry. Hover or tap any bar for its full count, share, and where it sits relative to this entry.

Source NY Office of Court Administration, Attorney Registration · May 2026

How Andrew compares to fellow Hofstra University Maurice A. Deane School Of Law alumni

Among the 3,317 Hofstra University Maurice A. Deane School Of Law graduates in the New York register, Andrew Lewis Aaron is longer-tenured than 99% - a school-cohort view of experience, alongside the statewide one above.

39 years vs. Hofstra University Maurice A. Deane School Of Law alumni

Years since admission - 3,317 NY-registered alumni of this school

39 Top 1% higher than 99% of 3,317 fellow alumni

This attorney 0 30 every registered alum of this school, bucketed by value

Each bar is a band; taller bars hold more fellow alumni. The dashed line + filled bar mark this entry. Hover or tap any bar for its full count, share, and where it sits relative to this entry.

Source NY Office of Court Administration, Attorney Registration · May 2026

Hofstra University Maurice A. Deane School Of Law's active-bar rate

Of Hofstra University Maurice A. Deane School Of Law's 4,142 alumni in the New York register, 86.1% currently hold "Currently registered" status, above the statewide average.

Hofstra University Maurice A. Deane School Of Law alumni, active-bar rate

0%100%New York avg66%86.1%
Hofstra University Maurice A. Deane School Of Law alumni, active-bar rate

The 1987 admission class today

Of the 5,948 attorneys admitted to the New York bar in 1987, 71.3% are still "Currently registered" today, above the statewide average across all admission years.

64%66%68%70%72% Statewide, all years1987 class 66.2% 71.3% ▲ +7.7%
Bar retention: statewide average vs. the 1987 admission class

Professional Details

Status
Currently registered
Registration Number
2091106
Year Admitted
1987 (39 yrs · veteran)
Judicial Department
2
Next Registration
Jul 2027

Location & Contact

Company
Andrew L. Aaron, P.C.
County
Nassau
ZIP Code
11050
Phone
(516) 829-6959

Status Distribution Across the New York Bar

Andrew Lewis Aaron's current status, "Currently registered", places this attorney in the 66.2% of the 429,620-attorney New York register currently marked active.

Full statewide breakdown & source note
Cohort Attorneys Share Profile relevance
Active in good standing 284,296
66.2%
This attorney is in this cohort
Other / inactive / discipline 145,324
33.8%
Verify status before engaging
Total registered 429,620 100.0% Full New York bar register

Source: NY Office of Court Administration, Attorney Registrations. Status counts reflect the latest reporting cycle. Bar status confirms registration only; it does not imply competence, specialty fit, or freedom from complaints.

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Before you rely on this record

Andrew Lewis Aaron's "Currently registered" listing confirms bar standing only, it is a registration fact to verify, not a verdict on quality or competence.

Frequently Asked Questions

Where is Andrew Aaron licensed?

Andrew Aaron is licensed to practice law in New York.

When was Andrew Lewis Aaron admitted to the bar?

Andrew Lewis Aaron's admission to the New York bar dates back to 1987.

Where did Andrew Lewis Aaron go to law school?

Andrew Lewis Aaron attended Hofstra University Maurice A. Deane School of Law.

What company does Andrew Lewis Aaron work for?

Andrew Lewis Aaron is associated with Andrew L. Aaron, P.C. in Port Washington, NY.

Is Andrew Lewis Aaron in good standing?

Yes, Andrew Lewis Aaron holds active bar status ("Currently registered").

Sourced from the NY Office of Court Administration, informational only, not legal advice. Full disclosure.