New York attorney record · Judicial Dept 1
Christie Michelle Bonasera
Fordham University alumna, admitted to the New York bar in 2003, registered office in Rye, NY. This established record's status, address, and registration history come straight from the NY Office of Court Administration.
- 2003
- Admitted
- 23
- Years in bar
- 4159521
- NY reg #
The record in one line
Christie Michelle Bonasera carries a "Delinquent" status on the New York bar register, on record since 2003 - confirm the exact standing and any discipline history directly with the state bar before engaging.
- 23 yrs
- since first admission to the bar
- Suspended
- current bar status: "Delinquent"
- #182 of 260
- by tenure in Rye office peers
- Law school
- Fordham University
Data updated September 2026
What this profile tells you
Bar status & tenure
Christie Michelle Bonasera is registered as bar number 4159521 with the New York bar authority, carrying a current status of "Delinquent", suspended or delinquent, verify terms with the bar before engaging. Registration is recorded within Judicial Department 1, the appellate division overseeing this attorney's home district.
Practice context & education
Practice address is listed under Willkie Farr & Gallagher LLP, located in Rye, NY (New York County), ZIP 10580. 5 other attorneys share this firm affiliation in the registry. Educational background: FORDHAM UNIVERSITY.
State context & due diligence
A "Delinquent" status falls outside the New York bar's active cohort. The breakdown below shows what share of the register that represents, and how to verify current standing directly with the state bar.
Tenure among Rye, NY office peers
Relative to the 260 NY-registered attorneys listing Rye, NY, Christie Michelle Bonasera is longer-tenured than 70% (local rank #182). See the Rye attorney directory .
- Local rank
- #182
- City cohort
- 260
- Local percentile
- 70th
- Admitted
- 2003
Nearest tenure peers in Rye
- Scott C. Baglio admitted 2003 · 23 yr
- Jason Blacksberg admitted 2003 · 23 yr
- Joanna Chloe Feldman admitted 2003 · 23 yr
- Eric L. Lane admitted 2003 · 23 yr
How local rank is computed
Rank uses years since NY-bar admission among non-deceased registry rows that list the same office city and state, a local placement, not a statewide claim. Source: NY Office of Court Administration Attorney Registration · as of September 2026. Derived local rank, not published upstream.
How Christie compares to fellow Fordham University alumni
Among the 2,321 Fordham University graduates in the New York register, Christie Michelle Bonasera is longer-tenured than 10%.
23 years vs. Fordham University alumni
Years since admission - 2,321 NY-registered alumni of this school
23 Top 90% higher than 10% of 2,321 fellow alumni
Each bar is a band; taller bars hold more fellow alumni. The dashed line + filled bar mark this entry. Hover or tap any bar for its full count, share, and where it sits relative to this entry.
Source NY Office of Court Administration, Attorney Registration · September 2026
The 2003 admission class today
Of the 8,250 attorneys admitted to the New York bar in 2003, 83.9% are still "Currently registered" today, above the statewide average across all admission years.
Professional Details
- Status
- Delinquent
- Registration Number
- 4159521
- Year Admitted
- 2003 (23 yrs · senior)
- Judicial Department
- 1
- Next Registration
- Jun 2027
Location & Contact
- Company
- Willkie Farr & Gallagher LLP
- City
- Rye, NY
- County
- New York
- ZIP Code
- 10580
- Phone
- (212) 206-3580
Education
FORDHAM UNIVERSITY
Status Distribution Across the New York Bar
Christie Michelle Bonasera's current status, "Delinquent", places this record outside the 67.2% of the 432,625-attorney New York register currently marked active.
Full statewide breakdown & source note
Source: NY Office of Court Administration, Attorney Registrations. Status counts reflect the latest reporting cycle. Bar status confirms registration only; it does not imply competence, specialty fit, or freedom from complaints.
Same firm affiliation: Willkie Farr & Gallagher LLP
Other NY-registered attorneys who share this firm name on the OCA register (not a geographic peer set).
Near-tenure Fordham University alumni
Fellow alumni on the NY register whose admission year is closest to 2003 (excluding same-firm colleagues above).
Same admission year (2003), other cities
NY-registered attorneys admitted in 2003 whose listed office city differs from Rye, a vintage cohort, not a neighborhood list.
Nationwide attorneys with similar admission year or city registry density
Two non-geo peer axes for Christie Michelle Bonasera: closest NY bar admission year outside NY, and closest out-of-state office cities by how many NY-registered attorneys they list (~261 here). Distinct from same-firm, fellow-alumni, and same-year other-city strips above.
Similar admission year (~2003)
Counts come from the NY State Office of Court Administration registration extract; peers are not a competence or practice-area ranking.
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Compare attorneys →Before you rely on this record
Christie Michelle Bonasera carries a "Delinquent" status. Verify the exact scope and dates of this action directly with the state bar before acting on it.
Frequently Asked Questions
Where is Christie Bonasera licensed?
Christie Bonasera is licensed to practice law in New York.
When was Christie Michelle Bonasera admitted to the bar?
Christie Michelle Bonasera was admitted to the bar in 2003.
Where did Christie Michelle Bonasera go to law school?
Christie Michelle Bonasera attended FORDHAM UNIVERSITY.
What company does Christie Michelle Bonasera work for?
Christie Michelle Bonasera is associated with Willkie Farr & Gallagher LLP in Rye, NY.
Is Christie Michelle Bonasera in good standing?
No, Christie Michelle Bonasera carries a "Delinquent" status, not active standing. Confirm the exact scope directly with the state bar before engaging.
Cite this page & disclosure
Sourced from the NY Office of Court Administration, informational only, not legal advice. Full disclosure.
Read our methodology - how this data is sourced, computed, and verified.