New York attorney record · Judicial Dept 1
David A. Baker
Loyola University Chicago alumna, admitted to the New York bar in 2008, registered office in Chicago, IL. This established record's status, address, and registration history come straight from the NY Office of Court Administration.
- 2008
- Admitted
- 18
- Years in bar
- 4593935
- NY reg #
The record in one line
David A. Baker appears in the New York attorney register with a current status of "Due to reregister within 30 days of birthday", on record since 2008 - an administrative designation rather than discipline, but confirm current standing with the state bar.
- 18 yrs
- since first admission to the bar
- Pending-renewal
- current bar status: "Due to reregister within 30 days of birthday"
- #856 of 2,245
- by tenure in Chicago office peers
- Law school
- Loyola University Chicago
Data updated August 2026
What this profile tells you
Bar status & tenure
David A. Baker is registered as bar number 4593935 with the New York bar authority, carrying a current status of "Due to reregister within 30 days of birthday", a routine periodic-renewal reminder, not discipline. Registration is recorded within Judicial Department 1, the appellate division overseeing this attorney's home district.
Practice context & education
Practice address is listed under Mcdermott Will & Schulte LLP, located in Chicago, IL, ZIP 60606. 5 other attorneys share this firm affiliation in the registry. Educational background: LOYOLA UNIVERSITY CHICAGO.
State context & due diligence
A "Due to reregister within 30 days of birthday" status falls outside the New York bar's active cohort for now. The breakdown below shows what share of the register that represents.
Tenure among Chicago, IL office peers
David A. Baker is earlier in the Chicago, IL office cohort than most peers: local tenure rank #856 of 2,245 (38th percentile). See the Chicago attorney directory .
- Local rank
- #856
- City cohort
- 2,245
- Local percentile
- 38th
- Admitted
- 2008
Nearest tenure peers in Chicago
- Oren Azar Amram admitted 2008 · 18 yr
- Morgan Kelly Anderson admitted 2008 · 18 yr
- Telly Andrews admitted 2008 · 18 yr
- Rami Bardenstein admitted 2008 · 18 yr
How local rank is computed
Rank uses years since NY-bar admission among non-deceased registry rows that list the same office city and state, a local placement, not a statewide claim. Source: NY Office of Court Administration Attorney Registration · as of August 2026. Derived local rank, not published upstream.
How David compares to fellow Loyola University Chicago alumni
Among the 60 Loyola University Chicago graduates in the New York register, David A. Baker is longer-tenured than 35%.
18 years vs. Loyola University Chicago alumni
Years since admission - 60 NY-registered alumni of this school
18 Top 65% higher than 35% of 60 fellow alumni
Each bar is a band; taller bars hold more fellow alumni. The dashed line + filled bar mark this entry. Hover or tap any bar for its full count, share, and where it sits relative to this entry.
Source NY Office of Court Administration, Attorney Registration · August 2026
The 2008 admission class today
Of the 9,683 attorneys admitted to the New York bar in 2008, 68.4% are still "Currently registered" today, above the statewide average across all admission years.
Professional Details
- Status
- Due to reregister within 30 days of birthday
- Registration Number
- 4593935
- Year Admitted
- 2008 (18 yrs · senior)
- Judicial Department
- 1
- Next Registration
- Sep 2026
Location & Contact
- Company
- Mcdermott Will & Schulte LLP
- City
- Chicago, IL
- ZIP Code
- 60606
- Phone
- (312) 984-7597
Education
LOYOLA UNIVERSITY CHICAGO
Status Distribution Across the New York Bar
David A. Baker's current status, "Due to reregister within 30 days of birthday", places this record outside the 67.2% of the 432,625-attorney New York register currently marked active.
Full statewide breakdown & source note
Source: NY Office of Court Administration, Attorney Registrations. Status counts reflect the latest reporting cycle. Bar status confirms registration only; it does not imply competence, specialty fit, or freedom from complaints.
Same firm affiliation: Mcdermott Will & Schulte LLP
Other NY-registered attorneys who share this firm name on the OCA register (not a geographic peer set).
Near-tenure Loyola University Chicago alumni
Fellow alumni on the NY register whose admission year is closest to 2008 (excluding same-firm colleagues above).
Same admission year (2008), other cities
NY-registered attorneys admitted in 2008 whose listed office city differs from Chicago, a vintage cohort, not a neighborhood list.
Nationwide attorneys with similar admission year or city registry density
Two non-geo peer axes for David A. Baker: closest NY bar admission year outside IL, and closest out-of-state office cities by how many NY-registered attorneys they list (~2,246 here). Distinct from same-firm, fellow-alumni, and same-year other-city strips above.
Similar admission year (~2008)
Counts come from the NY State Office of Court Administration registration extract; peers are not a competence or practice-area ranking.
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David A. Baker is currently listed as "Due to reregister within 30 days of birthday", treat that as a registration fact to confirm, not a verdict on quality.
Frequently Asked Questions
Where is David Baker licensed?
David Baker is licensed to practice law in New York.
When was David A. Baker admitted to the bar?
David A. Baker was admitted to the bar in 2008.
Where did David A. Baker go to law school?
David A. Baker attended LOYOLA UNIVERSITY CHICAGO.
What company does David A. Baker work for?
David A. Baker is associated with Mcdermott Will & Schulte LLP in Chicago, IL.
Is David A. Baker in good standing?
Not currently, David A. Baker's listed status is "Due to reregister within 30 days of birthday", not active standing. Confirm current status with the state bar.
Cite this page & disclosure
Sourced from the NY Office of Court Administration, informational only, not legal advice. Full disclosure.
Read our methodology - how this data is sourced, computed, and verified.