New York attorney record · Judicial Dept 1
David H. Chidekel
Hofstra University Maurice A. Deane School Of Law alumna, admitted to the New York bar in 1987, registered office in New York, NY. Decades of status, address, and registration history on this record come straight from the NY Office of Court Administration.
- 1987
- Admitted
- 39
- Years in bar
- 2131167
- NY reg #
The record in one line
David H. Chidekel appears in the New York attorney register with a current status of "Due to reregister within 30 days of birthday", on record since 1987 - an administrative designation rather than discipline, but confirm current standing with the state bar.
- 39 yrs
- since first admission to the bar
- Pending-renewal
- current bar status: "Due to reregister within 30 days of birthday"
- #10951 of 93,608
- by tenure in New York office peers
- Law school
- Hofstra University Maurice A. Deane School Of Law
Data updated September 2026
What this profile tells you
Bar status & tenure
David H. Chidekel is registered as bar number 2131167 with the New York bar authority, carrying a current status of "Due to reregister within 30 days of birthday", a routine periodic-renewal reminder, not discipline. Registration is recorded within Judicial Department 1, the appellate division overseeing this attorney's home district.
Practice context & education
Practice address is listed under Glinertchidekel, PLLC, located in New York, NY (New York County), ZIP 10017. Educational background: Hofstra University Maurice A. Deane School of Law.
State context & due diligence
A "Due to reregister within 30 days of birthday" status falls outside the New York bar's active cohort for now. The breakdown below shows what share of the register that represents.
Tenure among New York, NY office peers
David H. Chidekel is earlier in the New York, NY office cohort than most peers: local tenure rank #10,951 of 93,608 (12th percentile). See the New York attorney directory .
- Local rank
- #10,951
- City cohort
- 93,608
- Local percentile
- 12th
- Admitted
- 1987
Nearest tenure peers in New York
- Jay B. Abramson admitted 1987 · 39 yr
- Brian Adams admitted 1987 · 39 yr
- Andrew John Adelhardt Iii admitted 1987 · 39 yr
- Barry E. Adler admitted 1987 · 39 yr
How local rank is computed
Rank uses years since NY-bar admission among non-deceased registry rows that list the same office city and state, a local placement, not a statewide claim. Source: NY Office of Court Administration Attorney Registration · as of September 2026. Derived local rank, not published upstream.
How David compares to fellow Hofstra University Maurice A. Deane School Of Law alumni
Among the 3,425 Hofstra University Maurice A. Deane School Of Law graduates in the New York register, David H. Chidekel is longer-tenured than 99%.
39 years vs. Hofstra University Maurice A. Deane School Of Law alumni
Years since admission - 3,425 NY-registered alumni of this school
39 Top 1% higher than 99% of 3,425 fellow alumni
Each bar is a band; taller bars hold more fellow alumni. The dashed line + filled bar mark this entry. Hover or tap any bar for its full count, share, and where it sits relative to this entry.
Source NY Office of Court Administration, Attorney Registration · September 2026
The 1987 admission class today
Of the 5,948 attorneys admitted to the New York bar in 1987, 73.4% are still "Currently registered" today, above the statewide average across all admission years.
Professional Details
- Status
- Due to reregister within 30 days of birthday
- Registration Number
- 2131167
- Year Admitted
- 1987 (39 yrs · veteran)
- Judicial Department
- 1
- Next Registration
- Oct 2025
Location & Contact
- Company
- Glinertchidekel, PLLC
- City
- New York, NY
- County
- New York
- ZIP Code
- 10017
- Phone
- (212) 542-8882
Education
Hofstra University Maurice A. Deane School of Law
Status Distribution Across the New York Bar
David H. Chidekel's current status, "Due to reregister within 30 days of birthday", places this record outside the 67.2% of the 432,625-attorney New York register currently marked active.
Full statewide breakdown & source note
Source: NY Office of Court Administration, Attorney Registrations. Status counts reflect the latest reporting cycle. Bar status confirms registration only; it does not imply competence, specialty fit, or freedom from complaints.
Near-tenure Hofstra University Maurice A. Deane School Of Law alumni
Fellow alumni on the NY register whose admission year is closest to 1987 (excluding same-firm colleagues above).
Same admission year (1987), other cities
NY-registered attorneys admitted in 1987 whose listed office city differs from New York, a vintage cohort, not a neighborhood list.
Nationwide attorneys with similar admission year or city registry density
Two non-geo peer axes for David H. Chidekel: closest NY bar admission year outside NY, and closest out-of-state office cities by how many NY-registered attorneys they list (~93,609 here). Distinct from same-firm, fellow-alumni, and same-year other-city strips above.
Similar admission year (~1987)
Counts come from the NY State Office of Court Administration registration extract; peers are not a competence or practice-area ranking.
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David H. Chidekel is currently listed as "Due to reregister within 30 days of birthday", treat that as a registration fact to confirm, not a verdict on quality.
Frequently Asked Questions
Where is David Chidekel licensed?
David Chidekel is licensed to practice law in New York.
When was David H. Chidekel admitted to the bar?
David H. Chidekel's admission to the New York bar dates back to 1987.
Where did David H. Chidekel go to law school?
David H. Chidekel attended Hofstra University Maurice A. Deane School of Law.
What company does David H. Chidekel work for?
David H. Chidekel is associated with Glinertchidekel, PLLC in New York, NY.
Is David H. Chidekel in good standing?
Not currently, David H. Chidekel's listed status is "Due to reregister within 30 days of birthday", not active standing. Confirm current status with the state bar.
Cite this page & disclosure
Sourced from the NY Office of Court Administration, informational only, not legal advice. Full disclosure.
Read our methodology - how this data is sourced, computed, and verified.