New York attorney record · Judicial Dept 1
Eloise Marks Kauvar Hirsch
Fordham alumna, admitted to the New York bar in 2008, registered office in Denver, CO. This established record's status, address, and registration history come straight from the NY Office of Court Administration.
- 2008
- Admitted
- 18
- Years in bar
- 4621157
- NY reg #
The record in one line
Eloise Marks Kauvar Hirsch appears in the New York attorney register with a current status of "Due to reregister within 30 days of birthday", on record since 2008 - an administrative designation rather than discipline, but confirm current standing with the state bar.
- 18 yrs
- since first admission to the bar
- Pending-renewal
- current bar status: "Due to reregister within 30 days of birthday"
- #371 of 881
- by tenure in Denver office peers
- Law school
- Fordham
Data updated September 2026
What this profile tells you
Bar status & tenure
Eloise Marks Kauvar Hirsch is registered as bar number 4621157 with the New York bar authority, carrying a current status of "Due to reregister within 30 days of birthday", a routine periodic-renewal reminder, not discipline. Registration is recorded within Judicial Department 1, the appellate division overseeing this attorney's home district.
Practice context & education
Practice address is listed under Polsinelli PC, located in Denver, CO, ZIP 80202. 5 other attorneys share this firm affiliation in the registry. Educational background: FORDHAM.
State context & due diligence
A "Due to reregister within 30 days of birthday" status falls outside the New York bar's active cohort for now. The breakdown below shows what share of the register that represents.
Tenure among Denver, CO office peers
Relative to the 881 NY-registered attorneys listing Denver, CO, Eloise Marks Kauvar Hirsch is longer-tenured than 42% (local rank #371). See the Denver attorney directory .
- Local rank
- #371
- City cohort
- 881
- Local percentile
- 42nd
- Admitted
- 2008
Nearest tenure peers in Denver
- Robert Reeves Anderson admitted 2008 · 18 yr
- Keith Bradley admitted 2008 · 18 yr
- Lisa Beth Canarick admitted 2008 · 18 yr
- Carolyn Louise Cox admitted 2008 · 18 yr
How local rank is computed
Rank uses years since NY-bar admission among non-deceased registry rows that list the same office city and state, a local placement, not a statewide claim. Source: NY Office of Court Administration Attorney Registration · as of September 2026. Derived local rank, not published upstream.
How Eloise compares to fellow Fordham alumni
Among the 2,676 Fordham graduates in the New York register, Eloise Marks Kauvar Hirsch is longer-tenured than 5%.
18 years vs. Fordham alumni
Years since admission - 2,676 NY-registered alumni of this school
18 Top 95% higher than 5% of 2,676 fellow alumni
Each bar is a band; taller bars hold more fellow alumni. The dashed line + filled bar mark this entry. Hover or tap any bar for its full count, share, and where it sits relative to this entry.
Source NY Office of Court Administration, Attorney Registration · September 2026
The 2008 admission class today
Of the 9,683 attorneys admitted to the New York bar in 2008, 68.4% are still "Currently registered" today, above the statewide average across all admission years.
Professional Details
- Status
- Due to reregister within 30 days of birthday
- Registration Number
- 4621157
- Year Admitted
- 2008 (18 yrs · senior)
- Judicial Department
- 1
- Next Registration
- Sep 2026
Location & Contact
- Company
- Polsinelli PC
- City
- Denver, CO
- ZIP Code
- 80202
- Phone
- (303) 572-9300
Education
FORDHAM
Status Distribution Across the New York Bar
Eloise Marks Kauvar Hirsch's current status, "Due to reregister within 30 days of birthday", places this record outside the 67.2% of the 432,625-attorney New York register currently marked active.
Full statewide breakdown & source note
Source: NY Office of Court Administration, Attorney Registrations. Status counts reflect the latest reporting cycle. Bar status confirms registration only; it does not imply competence, specialty fit, or freedom from complaints.
Same firm affiliation: Polsinelli PC
Other NY-registered attorneys who share this firm name on the OCA register (not a geographic peer set).
Near-tenure Fordham alumni
Fellow alumni on the NY register whose admission year is closest to 2008 (excluding same-firm colleagues above).
Same admission year (2008), other cities
NY-registered attorneys admitted in 2008 whose listed office city differs from Denver, a vintage cohort, not a neighborhood list.
Nationwide attorneys with similar admission year or city registry density
Two non-geo peer axes for Eloise Marks Kauvar Hirsch: closest NY bar admission year outside CO, and closest out-of-state office cities by how many NY-registered attorneys they list (~882 here). Distinct from same-firm, fellow-alumni, and same-year other-city strips above.
Similar admission year (~2008)
Counts come from the NY State Office of Court Administration registration extract; peers are not a competence or practice-area ranking.
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Compare attorneys →Before you rely on this record
Eloise Marks Kauvar Hirsch is currently listed as "Due to reregister within 30 days of birthday", treat that as a registration fact to confirm, not a verdict on quality.
Frequently Asked Questions
Where is Eloise Hirsch licensed?
Eloise Hirsch is licensed to practice law in New York.
When was Eloise Marks Kauvar Hirsch admitted to the bar?
Eloise Marks Kauvar Hirsch was admitted to the bar in 2008.
Where did Eloise Marks Kauvar Hirsch go to law school?
Eloise Marks Kauvar Hirsch attended FORDHAM.
What company does Eloise Marks Kauvar Hirsch work for?
Eloise Marks Kauvar Hirsch is associated with Polsinelli PC in Denver, CO.
Is Eloise Marks Kauvar Hirsch in good standing?
Not currently, Eloise Marks Kauvar Hirsch's listed status is "Due to reregister within 30 days of birthday", not active standing. Confirm current status with the state bar.
Cite this page & disclosure
Sourced from the NY Office of Court Administration, informational only, not legal advice. Full disclosure.
Read our methodology - how this data is sourced, computed, and verified.