New York attorney record · Judicial Dept 1
Jung Y Sarah Kim
Fordham Univ Sch Of Law alumna, admitted to the New York bar in 1995, registered office in New York, NY. Decades of status, address, and registration history on this record come straight from the NY Office of Court Administration.
- 1995
- Admitted
- 31
- Years in bar
- 2686053
- NY reg #
The record in one line
With 31 years on the register since a 1995 admission, Jung Y Sarah Kim ranks among the New York bar's most senior active practitioners, longer-tenured than 71% of the currently-active bar.
- 31 yrs
- in active practice since admission
- Active
- current bar status: "Currently registered"
- #20200 of 93,608
- by tenure in New York office peers
- Law school
- Fordham Univ Sch Of Law
Data updated August 2026
What this profile tells you
Bar status & tenure
Registration 2686053 with the New York bar authority has long belonged to Jung Y Sarah Kim, a veteran practitioner still in active good standing. Registration is recorded within Judicial Department 1, the appellate division overseeing this attorney's home district.
Practice context & education
Practice address is listed under Hawkins Delafield & Wood LLP, located in New York, NY (New York County), ZIP 10005. 5 other attorneys share this firm affiliation in the registry. Educational background: FORDHAM UNIV SCH OF LAW.
State context & due diligence
After 31 years on the register, Jung Y Sarah Kim still falls within the New York bar's active cohort, a share of the register detailed further below.
Experience vs. the active New York bar
Few active New York attorneys match Jung Y Sarah Kim's 31 years since admission in 1995.
31 years on the New York bar
Years since admission, all currently-active NY attorneys
31 Top 29% higher than 71% of 290,787 active NY attorneys
Each bar is a band; taller bars hold more active NY attorneys. The dashed line + filled bar mark this entry. Hover or tap any bar for its full count, share, and where it sits relative to this entry.
Source NY Office of Court Administration, Attorney Registration · August 2026
Tenure among New York, NY office peers
Jung Y Sarah Kim is earlier in the New York, NY office cohort than most peers: local tenure rank #20,200 of 93,608 (22nd percentile). See the New York attorney directory .
- Local rank
- #20,200
- City cohort
- 93,608
- Local percentile
- 22nd
- Admitted
- 1995
Nearest tenure peers in New York
- Avrum Aaron admitted 1995 · 31 yr
- Linda Abdel-Malek admitted 1995 · 31 yr
- Laura K. Abel admitted 1995 · 31 yr
- Adam Michael Abensohn admitted 1995 · 31 yr
How local rank is computed
Rank uses years since NY-bar admission among non-deceased registry rows that list the same office city and state, a local placement, not a statewide claim. Source: NY Office of Court Administration Attorney Registration · as of August 2026. Derived local rank, not published upstream.
How Jung Y compares to fellow Fordham Univ Sch Of Law alumni
Among the 51 Fordham Univ Sch Of Law graduates in the New York register, Jung Y Sarah Kim is longer-tenured than 8%.
31 years vs. Fordham Univ Sch Of Law alumni
Years since admission - 51 NY-registered alumni of this school
31 Top 92% higher than 8% of 51 fellow alumni
Each bar is a band; taller bars hold more fellow alumni. The dashed line + filled bar mark this entry. Hover or tap any bar for its full count, share, and where it sits relative to this entry.
Source NY Office of Court Administration, Attorney Registration · August 2026
The 1995 admission class today
Of the 6,807 attorneys admitted to the New York bar in 1995, 80.2% are still "Currently registered" today, above the statewide average across all admission years.
Professional Details
- Status
- Currently registered
- Registration Number
- 2686053
- Year Admitted
- 1995 (31 yrs · veteran)
- Judicial Department
- 1
- Next Registration
- Nov 2027
Location & Contact
- Company
- Hawkins Delafield & Wood LLP
- City
- New York, NY
- County
- New York
- ZIP Code
- 10005
- Phone
- (212) 820-9467
Education
FORDHAM UNIV SCH OF LAW
Status Distribution Across the New York Bar
Jung Y Sarah Kim's current status, "Currently registered", places this attorney in the 67.2% of the 432,625-attorney New York register currently marked active.
Full statewide breakdown & source note
Source: NY Office of Court Administration, Attorney Registrations. Status counts reflect the latest reporting cycle. Bar status confirms registration only; it does not imply competence, specialty fit, or freedom from complaints.
Same firm affiliation: Hawkins Delafield & Wood LLP
Other NY-registered attorneys who share this firm name on the OCA register (not a geographic peer set).
Near-tenure Fordham Univ Sch Of Law alumni
Fellow alumni on the NY register whose admission year is closest to 1995 (excluding same-firm colleagues above).
Same admission year (1995), other cities
NY-registered attorneys admitted in 1995 whose listed office city differs from New York, a vintage cohort, not a neighborhood list.
Verify This Attorney
Verify on NY Courts Attorney SearchNearby Attorneys in New York, NY
Compare credentials side-by-side
Compare Jung Y Sarah Kim with similar attorneys in New York.
Compare attorneys →Before you rely on this record
Jung Y Sarah Kim's "Currently registered" listing confirms bar standing only, it is a registration fact to verify, not a verdict on quality or competence.
Frequently Asked Questions
Where is Jung Y Kim licensed?
Jung Y Kim is licensed to practice law in New York.
When was Jung Y Sarah Kim admitted to the bar?
Jung Y Sarah Kim's admission to the New York bar dates back to 1995.
Where did Jung Y Sarah Kim go to law school?
Jung Y Sarah Kim attended FORDHAM UNIV SCH OF LAW.
What company does Jung Y Sarah Kim work for?
Jung Y Sarah Kim is associated with Hawkins Delafield & Wood LLP in New York, NY.
Is Jung Y Sarah Kim in good standing?
Yes, Jung Y Sarah Kim holds active bar status ("Currently registered").
Cite this page & disclosure
Sourced from the NY Office of Court Administration, informational only, not legal advice. Full disclosure.
Read our methodology - how this data is sourced, computed, and verified.