New York attorney record · Judicial Dept 1
Melissa Lynn Gelade
Fordham University alumna, admitted to the New York bar in 2001, registered office in Madison, NJ. Decades of status, address, and registration history on this record come straight from the NY Office of Court Administration.
- 2001
- Admitted
- 25
- Years in bar
- 3974359
- NY reg #
The record in one line
With 25 years on the register since a 2001 admission, Melissa Lynn Gelade ranks among the New York bar's most senior active practitioners, longer-tenured than 62% of the currently-active bar.
- 25 yrs
- in active practice since admission
- Active
- current bar status: "Currently registered"
- #73 of 181
- by tenure in Madison office peers
- Law school
- Fordham University
Data updated August 2026
What this profile tells you
Bar status & tenure
Registration 3974359 with the New York bar authority has long belonged to Melissa Lynn Gelade, a veteran practitioner still in active good standing. Registration is recorded within Judicial Department 1, the appellate division overseeing this attorney's home district.
Practice context & education
Practice address is listed under Kelley Drye & Warren LLP, located in Madison, NJ, ZIP 07940. 5 other attorneys share this firm affiliation in the registry. Educational background: FORDHAM UNIVERSITY (3,999 registered alumni).
State context & due diligence
After 25 years on the register, Melissa Lynn Gelade still falls within the New York bar's active cohort, a share of the register detailed further below.
Experience vs. the active New York bar
Few active New York attorneys match Melissa Lynn Gelade's 25 years since admission in 2001.
25 years on the New York bar
Years since admission, all currently-active NY attorneys
25 Top 38% higher than 62% of 290,787 active NY attorneys
Each bar is a band; taller bars hold more active NY attorneys. The dashed line + filled bar mark this entry. Hover or tap any bar for its full count, share, and where it sits relative to this entry.
Source NY Office of Court Administration, Attorney Registration · August 2026
Tenure among Madison, NJ office peers
Against Madison, NJ's 181-attorney NY register cohort, Melissa Lynn Gelade lands at the 40th tenure percentile (rank #73). See the Madison attorney directory .
- Local rank
- #73
- City cohort
- 181
- Local percentile
- 40th
- Admitted
- 2001
Nearest tenure peers in Madison
- John Kenyon Fetterly admitted 2001 · 25 yr
- Steven Mark Friedland admitted 2001 · 25 yr
- Bridget Marie Polloway admitted 2001 · 25 yr
- Marcia Miller Wefelmeier admitted 2001 · 25 yr
How local rank is computed
Rank uses years since NY-bar admission among non-deceased registry rows that list the same office city and state, a local placement, not a statewide claim. Source: NY Office of Court Administration Attorney Registration · as of August 2026. Derived local rank, not published upstream.
How Melissa compares to fellow Fordham University alumni
Among the 2,321 Fordham University graduates in the New York register, Melissa Lynn Gelade is longer-tenured than 43%.
25 years vs. Fordham University alumni
Years since admission - 2,321 NY-registered alumni of this school
25 Top 57% higher than 43% of 2,321 fellow alumni
Each bar is a band; taller bars hold more fellow alumni. The dashed line + filled bar mark this entry. Hover or tap any bar for its full count, share, and where it sits relative to this entry.
Source NY Office of Court Administration, Attorney Registration · August 2026
Fordham University's active-bar rate
Of Fordham University's 3,999 alumni in the New York register, 61.4% currently hold "Currently registered" status, below the statewide average.
Fordham University alumni, active-bar rate
The 2001 admission class today
Of the 7,416 attorneys admitted to the New York bar in 2001, 82.5% are still "Currently registered" today, above the statewide average across all admission years.
Professional Details
- Status
- Currently registered
- Registration Number
- 3974359
- Year Admitted
- 2001 (25 yrs · veteran)
- Judicial Department
- 1
- Next Registration
- Jun 2027
Location & Contact
- Company
- Kelley Drye & Warren LLP
- City
- Madison, NJ
- ZIP Code
- 07940
- Phone
- (973) 503-5907
Education
Status Distribution Across the New York Bar
Melissa Lynn Gelade's current status, "Currently registered", places this attorney in the 67.2% of the 432,625-attorney New York register currently marked active.
Full statewide breakdown & source note
Source: NY Office of Court Administration, Attorney Registrations. Status counts reflect the latest reporting cycle. Bar status confirms registration only; it does not imply competence, specialty fit, or freedom from complaints.
Same firm affiliation: Kelley Drye & Warren LLP
Other NY-registered attorneys who share this firm name on the OCA register (not a geographic peer set).
Near-tenure Fordham University alumni
Fellow alumni on the NY register whose admission year is closest to 2001 (excluding same-firm colleagues above).
Same admission year (2001), other cities
NY-registered attorneys admitted in 2001 whose listed office city differs from Madison, a vintage cohort, not a neighborhood list.
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Compare attorneys →Before you rely on this record
Melissa Lynn Gelade's "Currently registered" listing confirms bar standing only, it is a registration fact to verify, not a verdict on quality or competence.
Frequently Asked Questions
Where is Melissa Gelade licensed?
Melissa Gelade is licensed to practice law in New York.
When was Melissa Lynn Gelade admitted to the bar?
Melissa Lynn Gelade's admission to the New York bar dates back to 2001.
Where did Melissa Lynn Gelade go to law school?
Melissa Lynn Gelade attended FORDHAM UNIVERSITY.
What company does Melissa Lynn Gelade work for?
Melissa Lynn Gelade is associated with Kelley Drye & Warren LLP in Madison, NJ.
Is Melissa Lynn Gelade in good standing?
Yes, Melissa Lynn Gelade holds active bar status ("Currently registered").
Cite this page & disclosure
Sourced from the NY Office of Court Administration, informational only, not legal advice. Full disclosure.
Read our methodology - how this data is sourced, computed, and verified.