Michael Allen Ecker
On the New York attorney register since 2004 · office in New York, NY
PlainAttorney’s reading of the public register file, not a court record.
- Registration No.
- 4209110
- Admitted
- 2004 · First Department
- Status
- Currently registered
- Next registration
- Feb 2028
Michael Allen Ecker is currently registered on the New York attorney register file of Sep 29, 2026. Admitted in 2004 in the First Department, with an office in New York, NY; next registration due Feb 2028. The status is the same in all 3 files we hold.
What this status means on the register
On the register, “Currently registered” means Michael Allen Ecker has filed the biennial registration the court system requires; the next one is due in Feb 2028.
- Currently registered unchanged
- Currently registered unchanged
- Currently registered the first file we hold
Source: NY Office of Court Administration, attorney registration file (data.ny.gov, dataset eqw2-r5nb), downloaded Sep 29, 2026; the Jul 3, 2026 and Aug 6, 2026 files for the history.
Others who list this employer on the register
531 other attorneys list Morgan, Lewis & Bockius LLP or one of its other names as their employer on the register; 123 of them were admitted before 2004, and 251 of the 532 give an office in New York, NY. The 5 whose admission is closest to 2004, earliest first:
| Attorney | Admitted | Status |
|---|---|---|
| Ayman Hasan Abdel-Khaleq | 2004 | Currently registered |
| Mana Behbin | 2004 | Currently registered |
| Kevin James Biron | 2004 | Currently registered |
| Scott David Clausen | 2004 | Currently registered |
| Priti K. Dave | 2004 | Currently registered |
Source: NY Office of Court Administration, attorney registration file (data.ny.gov, dataset eqw2-r5nb), downloaded Sep 29, 2026; employer spellings merged (methodology).
Where this record sits on the register
Michael Allen Ecker studied at Tulane University Law School (the register spells it “TULANE UNIV. LAW SCHOOL”). 694 of its 2,194 living graduates on the register were admitted in the 2000s, as Michael Allen Ecker was.
- Same law school
- 2,194living graduates; 87.7% registered (current or due), against 87.1% overall
- Office in New York, NY
- 93,604living registrants
Of the 93,604 living registrants with an office in New York, NY, 34,876 were admitted before 2004 and 56,900 after.
Source: NY Office of Court Administration, attorney registration file (data.ny.gov, dataset eqw2-r5nb), downloaded Sep 29, 2026; living registrants only.
Questions this record leads to
- Everyone who lists Morgan, Lewis & Bockius LLP532 on the register, 123 of the others admitted before 2004; 251 of the 532 give an office in New York, NY.
- Tulane University Law School graduates on the register2,194 living, 87.7% registered; 7 of them list Morgan, Lewis & Bockius LLP.
- Attorneys with an office in New York, NY93,604 living registrants give an office there.
- New York County’s registered bar75,989 currently registered, 46.63 per 1,000 residents.
- Admitted in 20048,407 people admitted in 2004 are on the register, 3,062 of them through the First Department.
- Every registration that reads “Currently registered”286,911 on the register file of Sep 29, 2026, by decade of admission.
- What a New York lawyer may chargeThe court rules on fees, retainers and fee disputes, each cited.
How to confirm it officially
For a statement of Michael Allen Ecker’s standing, contact the Attorney Registration Unit of the NY Office of Court Administration (nycourts.gov/attorneys), or ask the Appellate Division, First Department, which admitted Michael Allen Ecker in 2004. A complaint about this attorney would go to the First Department’s grievance committee, which covers New York County, where the register places the office.
This page reads the register file of Sep 29, 2026, and the court system’s own search can be newer; the register shows only the current value, so a suspension that ended before the files we hold, or a censure, leaves no trace here (Appellate Division decisions are published through the court system’s Law Reporting Bureau).