New York attorney record · Judicial Dept 1
Robert Lee Heckart
Harvard Law School alumna, admitted to the New York bar in 1974, registered office in New York, NY. A half-lifetime's worth of status, address, and registration history on this record come straight from the NY Office of Court Administration.
- 1974
- Admitted
- 52
- Years in bar
- 1257096
- NY reg #
The record in one line
Robert Lee Heckart has spent 52 years on the register since admission in 1974, one of the longest-standing active practitioners the state bar carries at 96% tenure percentile.
- 52 yrs
- in active practice since admission
- Active
- current bar status: "Currently registered"
- #2204 of 93,608
- by tenure in New York office peers
- Law school
- Harvard Law School
Data updated August 2026
What this profile tells you
Bar status & tenure
Robert Lee Heckart has carried New York bar registration 1257096 for the better part of a career, still active and in good standing. Registration is recorded within Judicial Department 1, the appellate division overseeing this attorney's home district.
Practice context & education
Practice address is listed under Davis Polk & Wardwell LLP, located in New York, NY (New York County), ZIP 10017. 5 other attorneys share this firm affiliation in the registry. Educational background: Harvard Law School (9,205 registered alumni).
State context & due diligence
Across a career spanning 52 years, Robert Lee Heckart has remained part of the New York bar's active cohort, a share of the register detailed further below.
Experience vs. the active New York bar
Robert Lee Heckart's 52 years since a 1974 admission places this record near the far edge of the statewide tenure curve below.
52 years on the New York bar
Years since admission, all currently-active NY attorneys
52 Top 4% higher than 96% of 290,787 active NY attorneys
Each bar is a band; taller bars hold more active NY attorneys. The dashed line + filled bar mark this entry. Hover or tap any bar for its full count, share, and where it sits relative to this entry.
Source NY Office of Court Administration, Attorney Registration · August 2026
Tenure among New York, NY office peers
Robert Lee Heckart is earlier in the New York, NY office cohort than most peers: local tenure rank #2,204 of 93,608 (2nd percentile). See the New York attorney directory .
- Local rank
- #2,204
- City cohort
- 93,608
- Local percentile
- 2nd
- Admitted
- 1974
Nearest tenure peers in New York
- Alan S. Adolph admitted 1974 · 52 yr
- Peter Charles Alkalay admitted 1974 · 52 yr
- Thomas Graham Amon admitted 1974 · 52 yr
- Robert James Anderson admitted 1974 · 52 yr
How local rank is computed
Rank uses years since NY-bar admission among non-deceased registry rows that list the same office city and state, a local placement, not a statewide claim. Source: NY Office of Court Administration Attorney Registration · as of August 2026. Derived local rank, not published upstream.
How Robert compares to fellow Harvard Law School alumni
Among the 8,724 Harvard Law School graduates in the New York register, Robert Lee Heckart is longer-tenured than 99%.
52 years vs. Harvard Law School alumni
Years since admission - 8,724 NY-registered alumni of this school
52 Top 1% higher than 99% of 8,724 fellow alumni
Each bar is a band; taller bars hold more fellow alumni. The dashed line + filled bar mark this entry. Hover or tap any bar for its full count, share, and where it sits relative to this entry.
Source NY Office of Court Administration, Attorney Registration · August 2026
Harvard Law School's active-bar rate
Of Harvard Law School's 9,205 alumni in the New York register, 74.8% currently hold "Currently registered" status, above the statewide average.
The 1974 admission class today
Of the 2,908 attorneys admitted to the New York bar in 1974, 46.2% are still "Currently registered" today, below the statewide average across all admission years.
Professional Details
- Status
- Currently registered
- Registration Number
- 1257096
- Year Admitted
- 1974 (52 yrs · veteran)
- Judicial Department
- 1
- Next Registration
- Jun 2028
Location & Contact
- Company
- Davis Polk & Wardwell LLP
- City
- New York, NY
- County
- New York
- ZIP Code
- 10017
- Phone
- (212) 450-4312
Education
Status Distribution Across the New York Bar
Robert Lee Heckart's current status, "Currently registered", places this attorney in the 67.2% of the 432,625-attorney New York register currently marked active.
Full statewide breakdown & source note
Source: NY Office of Court Administration, Attorney Registrations. Status counts reflect the latest reporting cycle. Bar status confirms registration only; it does not imply competence, specialty fit, or freedom from complaints.
Same firm affiliation: Davis Polk & Wardwell LLP
Other NY-registered attorneys who share this firm name on the OCA register (not a geographic peer set).
Near-tenure Harvard Law School alumni
Fellow alumni on the NY register whose admission year is closest to 1974 (excluding same-firm colleagues above).
Same admission year (1974), other cities
NY-registered attorneys admitted in 1974 whose listed office city differs from New York, a vintage cohort, not a neighborhood list.
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Compare attorneys →Before you rely on this record
Robert Lee Heckart's "Currently registered" listing confirms bar standing only, it is a registration fact to verify, not a verdict on quality or competence.
Frequently Asked Questions
Where is Robert Heckart licensed?
Robert Heckart is licensed to practice law in New York.
When was Robert Lee Heckart admitted to the bar?
Robert Lee Heckart's admission to the New York bar dates back to 1974.
Where did Robert Lee Heckart go to law school?
Robert Lee Heckart attended Harvard Law School.
What company does Robert Lee Heckart work for?
Robert Lee Heckart is associated with Davis Polk & Wardwell LLP in New York, NY.
Is Robert Lee Heckart in good standing?
Yes, Robert Lee Heckart holds active bar status ("Currently registered").
Cite this page & disclosure
Sourced from the NY Office of Court Administration, informational only, not legal advice. Full disclosure.
Read our methodology - how this data is sourced, computed, and verified.