New York attorney record · Judicial Dept 3

Benjamin Radcliff Menge

Washington And Lee University alumna, admitted to the New York bar in 2009, registered office in Birmingham, AL. This established record's status, address, and registration history come straight from the NY Office of Court Administration.

2009
Admitted
17
Years in bar
4710307
NY reg #

The record in one line

Benjamin Radcliff Menge appears in the New York attorney register with a current status of "Due to reregister within 30 days of birthday", on record since 2009 - an administrative designation rather than discipline, but confirm current standing with the state bar.

17 yrs
since first admission to the bar
Pending-renewal
current bar status: "Due to reregister within 30 days of birthday"
Law school
Washington And Lee University

Data updated May 2026

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Bar status
Due to reregister within 30 days of birthday
pending-renewal
Current registration status per NY Office of Court Administration
Year admitted
2009
17 years
Year of first admission to the New York bar
Law school
Washington And Lee University
64.9% active rate
Law school attended, with active-bar rate where available
Registration
4710307
NY registration #
Official NY OCA attorney registration number

What this profile tells you

Bar status & tenure

Benjamin Radcliff Menge is registered as bar number 4710307 with the New York bar authority, carrying a current status of "Due to reregister within 30 days of birthday", a routine periodic-renewal reminder, not discipline. Registration is recorded within Judicial Department 3, the appellate division overseeing this attorney's home district.

Practice context & education

Practice address is listed under C/O Tom Beckbe, located in Birmingham, AL, ZIP 35213. Educational background: WASHINGTON AND LEE UNIVERSITY (57 registered alumni).

State context & due diligence

A "Due to reregister within 30 days of birthday" status falls outside the New York bar's active cohort for now. The breakdown below shows what share of the register that represents.

Washington And Lee University's active-bar rate

Of Washington And Lee University's 57 alumni in the New York register, 64.9% currently hold "Currently registered" status, below the statewide average.

Washington And Lee University alumni, active-bar rate

0%100%New York avg66%64.9%
Washington And Lee University alumni, active-bar rate

The 2009 admission class today

Of the 10,203 attorneys admitted to the New York bar in 2009, 84.8% are still "Currently registered" today, above the statewide average across all admission years.

60%70%80%90% Statewide, all years2009 class 66.2% 84.8% ▲ +28.1%
Bar retention: statewide average vs. the 2009 admission class

Professional Details

Status
Due to reregister within 30 days of birthday
Registration Number
4710307
Year Admitted
2009 (17 yrs · senior)
Judicial Department
3
Next Registration
Nov 2025

Location & Contact

Company
C/O Tom Beckbe
ZIP Code
35213
Phone
(205) 521-8396

Status Distribution Across the New York Bar

Benjamin Radcliff Menge's current status, "Due to reregister within 30 days of birthday", places this record outside the 66.2% of the 429,620-attorney New York register currently marked active.

Full statewide breakdown & source note
Cohort Attorneys Share Profile relevance
Active in good standing 284,296
66.2%
This attorney is outside this cohort
Other / inactive / discipline 145,324
33.8%
Verify status before engaging
Total registered 429,620 100.0% Full New York bar register

Source: NY Office of Court Administration, Attorney Registrations. Status counts reflect the latest reporting cycle. Bar status confirms registration only; it does not imply competence, specialty fit, or freedom from complaints.

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Before you rely on this record

Benjamin Radcliff Menge is currently listed as "Due to reregister within 30 days of birthday", treat that as a registration fact to confirm, not a verdict on quality.

Frequently Asked Questions

Where is Benjamin Menge licensed?

Benjamin Menge is licensed to practice law in New York.

When was Benjamin Radcliff Menge admitted to the bar?

Benjamin Radcliff Menge was admitted to the bar in 2009.

Where did Benjamin Radcliff Menge go to law school?

Benjamin Radcliff Menge attended WASHINGTON AND LEE UNIVERSITY.

What company does Benjamin Radcliff Menge work for?

Benjamin Radcliff Menge is associated with C/O Tom Beckbe in Birmingham, AL.

Is Benjamin Radcliff Menge in good standing?

Not currently, Benjamin Radcliff Menge's listed status is "Due to reregister within 30 days of birthday", not active standing. Confirm current status with the state bar.

Sourced from the NY Office of Court Administration, informational only, not legal advice. Full disclosure.