New York attorney record · Judicial Dept 3
Benjamin Radcliff Menge
Washington And Lee University alumna, admitted to the New York bar in 2009, registered office in Birmingham, AL. This established record's status, address, and registration history come straight from the NY Office of Court Administration.
- 2009
- Admitted
- 17
- Years in bar
- 4710307
- NY reg #
The record in one line
Benjamin Radcliff Menge has held an active New York bar license for 17 years - admitted in 2009, longer-tenured than 38% of the state's currently-active attorneys.
- 17 yrs
- in active practice since admission
- Active
- current bar status: "Currently registered"
- #40 of 78
- by tenure in Birmingham office peers
- Law school
- Washington And Lee University
Data updated August 2026
What this profile tells you
Bar status & tenure
Benjamin Radcliff Menge carries New York bar registration 4710307, an established, active practitioner in good standing. Registration is recorded within Judicial Department 3, the appellate division overseeing this attorney's home district.
Practice context & education
Practice address is listed under C/O Tom Beckbe, located in Birmingham, AL, ZIP 35213. Educational background: WASHINGTON AND LEE UNIVERSITY (56 registered alumni).
State context & due diligence
With an established practice on record, Benjamin Radcliff Menge remains inside the New York bar's active cohort - see below for how that share of the register compares.
Experience vs. the active New York bar
Benjamin Radcliff Menge was admitted in 2009, giving 17 years on the New York register.
17 years on the New York bar
Years since admission, all currently-active NY attorneys
17 Top 62% higher than 38% of 290,787 active NY attorneys
Each bar is a band; taller bars hold more active NY attorneys. The dashed line + filled bar mark this entry. Hover or tap any bar for its full count, share, and where it sits relative to this entry.
Source NY Office of Court Administration, Attorney Registration · August 2026
Tenure among Birmingham, AL office peers
Against Birmingham, AL's 78-attorney NY register cohort, Benjamin Radcliff Menge lands at the 50th tenure percentile (rank #40). See the Birmingham attorney directory .
- Local rank
- #40
- City cohort
- 78
- Local percentile
- 50th
- Admitted
- 2009
Nearest tenure peers in Birmingham
- Amanda M. Donat admitted 2009 · 17 yr
- Robert R. Maddox admitted 2009 · 17 yr
- Charles Randall Minor admitted 2009 · 17 yr
- David Brian O'Dell admitted 2009 · 17 yr
How local rank is computed
Rank uses years since NY-bar admission among non-deceased registry rows that list the same office city and state, a local placement, not a statewide claim. Source: NY Office of Court Administration Attorney Registration · as of August 2026. Derived local rank, not published upstream.
Washington And Lee University's active-bar rate
Of Washington And Lee University's 56 alumni in the New York register, 64.3% currently hold "Currently registered" status, below the statewide average.
The 2009 admission class today
Of the 10,203 attorneys admitted to the New York bar in 2009, 87.4% are still "Currently registered" today, above the statewide average across all admission years.
Professional Details
- Status
- Currently registered
- Registration Number
- 4710307
- Year Admitted
- 2009 (17 yrs · senior)
- Judicial Department
- 3
- Next Registration
- Nov 2027
Location & Contact
- Company
- C/O Tom Beckbe
- City
- Birmingham, AL
- ZIP Code
- 35213
- Phone
- (205) 521-8396
Education
Status Distribution Across the New York Bar
Benjamin Radcliff Menge's current status, "Currently registered", places this attorney in the 67.2% of the 432,625-attorney New York register currently marked active.
Full statewide breakdown & source note
Source: NY Office of Court Administration, Attorney Registrations. Status counts reflect the latest reporting cycle. Bar status confirms registration only; it does not imply competence, specialty fit, or freedom from complaints.
Near-tenure Washington And Lee University alumni
Fellow alumni on the NY register whose admission year is closest to 2009 (excluding same-firm colleagues above).
Same admission year (2009), other cities
NY-registered attorneys admitted in 2009 whose listed office city differs from Birmingham, a vintage cohort, not a neighborhood list.
Nationwide attorneys with similar admission year or city registry density
Two non-geo peer axes for Benjamin Radcliff Menge: closest NY bar admission year outside AL, and closest out-of-state office cities by how many NY-registered attorneys they list (~79 here). Distinct from same-firm, fellow-alumni, and same-year other-city strips above.
Similar admission year (~2009)
Counts come from the NY State Office of Court Administration registration extract; peers are not a competence or practice-area ranking.
Verify This Attorney
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Compare attorneys →Before you rely on this record
Benjamin Radcliff Menge's "Currently registered" listing confirms bar standing only, it is a registration fact to verify, not a verdict on quality or competence.
Frequently Asked Questions
Where is Benjamin Menge licensed?
Benjamin Menge is licensed to practice law in New York.
When was Benjamin Radcliff Menge admitted to the bar?
Benjamin Radcliff Menge was admitted to the bar in 2009.
Where did Benjamin Radcliff Menge go to law school?
Benjamin Radcliff Menge attended WASHINGTON AND LEE UNIVERSITY.
What company does Benjamin Radcliff Menge work for?
Benjamin Radcliff Menge is associated with C/O Tom Beckbe in Birmingham, AL.
Is Benjamin Radcliff Menge in good standing?
Yes, Benjamin Radcliff Menge holds active bar status ("Currently registered").
Cite this page & disclosure
Sourced from the NY Office of Court Administration, informational only, not legal advice. Full disclosure.
Read our methodology - how this data is sourced, computed, and verified.