New York attorney record · Judicial Dept 2
David Laurence Kohn
Hofstra University alumna, admitted to the New York bar in 1994, registered office in Edison, NJ. Decades of status, address, and registration history on this record come straight from the NY Office of Court Administration.
- 1994
- Admitted
- 32
- Years in bar
- 2613339
- NY reg #
The record in one line
David Laurence Kohn carries a "Delinquent" status on the New York bar register, on record since 1994 - confirm the exact standing and any discipline history directly with the state bar before engaging.
- 32 yrs
- since first admission to the bar
- Suspended
- current bar status: "Delinquent"
- #38 of 186
- by tenure in Edison office peers
- Law school
- Hofstra University
Data updated September 2026
What this profile tells you
Bar status & tenure
David Laurence Kohn is registered as bar number 2613339 with the New York bar authority, carrying a current status of "Delinquent", suspended or delinquent, verify terms with the bar before engaging. Registration is recorded within Judicial Department 2, the appellate division overseeing this attorney's home district.
Practice context & education
Practice address is listed under Mazars Usa LLP, located in Edison, NJ, ZIP 08837. 2 other attorneys share this firm affiliation in the registry. Educational background: HOFSTRA UNIVERSITY.
State context & due diligence
A "Delinquent" status falls outside the New York bar's active cohort. The breakdown below shows what share of the register that represents, and how to verify current standing directly with the state bar.
Tenure among Edison, NJ office peers
David Laurence Kohn is toward the newer end of Edison, NJ's NY register cohort: #38 of 186 by years since admission. See the Edison attorney directory .
- Local rank
- #38
- City cohort
- 186
- Local percentile
- 20th
- Admitted
- 1994
Nearest tenure peers in Edison
- Eric Labes Harrison admitted 1994 · 32 yr
- Zhiyu Hu admitted 1994 · 32 yr
- Jared Paul Kingsley admitted 1994 · 32 yr
- Maxine Yi Hwa Lee admitted 1994 · 32 yr
How local rank is computed
Rank uses years since NY-bar admission among non-deceased registry rows that list the same office city and state, a local placement, not a statewide claim. Source: NY Office of Court Administration Attorney Registration · as of September 2026. Derived local rank, not published upstream.
How David compares to fellow Hofstra University alumni
Among the 1,536 Hofstra University graduates in the New York register, David Laurence Kohn is longer-tenured than 63%.
32 years vs. Hofstra University alumni
Years since admission - 1,536 NY-registered alumni of this school
32 Top 37% higher than 63% of 1,536 fellow alumni
Each bar is a band; taller bars hold more fellow alumni. The dashed line + filled bar mark this entry. Hover or tap any bar for its full count, share, and where it sits relative to this entry.
Source NY Office of Court Administration, Attorney Registration · September 2026
The 1994 admission class today
Of the 6,410 attorneys admitted to the New York bar in 1994, 61.7% are still "Currently registered" today, below the statewide average across all admission years.
Professional Details
- Status
- Delinquent
- Registration Number
- 2613339
- Year Admitted
- 1994 (32 yrs · veteran)
- Judicial Department
- 2
- Next Registration
- Jul 2026
Location & Contact
- Company
- Mazars Usa LLP
- City
- Edison, NJ
- ZIP Code
- 08837
- Phone
- (732) 475-2127
Education
HOFSTRA UNIVERSITY
Status Distribution Across the New York Bar
David Laurence Kohn's current status, "Delinquent", places this record outside the 67.2% of the 432,625-attorney New York register currently marked active.
Full statewide breakdown & source note
Source: NY Office of Court Administration, Attorney Registrations. Status counts reflect the latest reporting cycle. Bar status confirms registration only; it does not imply competence, specialty fit, or freedom from complaints.
Same firm affiliation: Mazars Usa LLP
Other NY-registered attorneys who share this firm name on the OCA register (not a geographic peer set).
View all attorneys at this firm →Near-tenure Hofstra University alumni
Fellow alumni on the NY register whose admission year is closest to 1994 (excluding same-firm colleagues above).
Same admission year (1994), other cities
NY-registered attorneys admitted in 1994 whose listed office city differs from Edison, a vintage cohort, not a neighborhood list.
Nationwide attorneys with similar admission year or city registry density
Two non-geo peer axes for David Laurence Kohn: closest NY bar admission year outside NJ, and closest out-of-state office cities by how many NY-registered attorneys they list (~187 here). Distinct from same-firm, fellow-alumni, and same-year other-city strips above.
Similar admission year (~1994)
Counts come from the NY State Office of Court Administration registration extract; peers are not a competence or practice-area ranking.
Verify This Attorney
Verify on NY Courts Attorney SearchNearby Attorneys in Edison, NJ
Compare credentials side-by-side
Compare David Laurence Kohn with similar attorneys in Edison.
Compare attorneys →Before you rely on this record
David Laurence Kohn carries a "Delinquent" status. Verify the exact scope and dates of this action directly with the state bar before acting on it.
Frequently Asked Questions
Where is David Kohn licensed?
David Kohn is licensed to practice law in New York.
When was David Laurence Kohn admitted to the bar?
David Laurence Kohn's admission to the New York bar dates back to 1994.
Where did David Laurence Kohn go to law school?
David Laurence Kohn attended HOFSTRA UNIVERSITY.
What company does David Laurence Kohn work for?
David Laurence Kohn is associated with Mazars Usa LLP in Edison, NJ.
Is David Laurence Kohn in good standing?
No, David Laurence Kohn carries a "Delinquent" status, not active standing. Confirm the exact scope directly with the state bar before engaging.
Cite this page & disclosure
Sourced from the NY Office of Court Administration, informational only, not legal advice. Full disclosure.
Read our methodology - how this data is sourced, computed, and verified.