New York attorney record · Judicial Dept 3
Huihua Xi
Vanderbilt Univ. Law School alumna, admitted to the New York bar in 2011. This established record's status, address, and registration history come straight from the NY Office of Court Administration.
- 2011
- Admitted
- 15
- Years in bar
- 4921557
- NY reg #
The record in one line
Huihua Xi has held an active New York bar license for 15 years - admitted in 2011, longer-tenured than 37% of the state's currently-active attorneys.
- 15 yrs
- in active practice since admission
- Active
- current bar status: "Currently registered"
- Top 63%
- by tenure among active NY attorneys
- Law school
- Vanderbilt Univ. Law School
Data updated May 2026
What this profile tells you
Bar status & tenure
Huihua Xi carries New York bar registration 4921557, an established, active practitioner in good standing. Registration is recorded within Judicial Department 3, the appellate division overseeing this attorney's home district.
Practice context & education
Practice address is listed under Hwabao Trust Co., Ltd., located in Shanghai 200122. Educational background: VANDERBILT UNIV. LAW SCHOOL (12 registered alumni).
State context & due diligence
With an established practice on record, Huihua Xi remains inside the New York bar's active cohort - see below for how that share of the register compares.
Experience vs. the active New York bar
Huihua Xi was admitted in 2011, giving 15 years on the New York register. The histogram places that tenure against every currently-active attorney in the state, taller bars hold more attorneys at that experience level.
15 years on the New York bar
Years since admission, all currently-active NY attorneys
15 Top 63% higher than 37% of 284,296 active NY attorneys
Each bar is a band; taller bars hold more active NY attorneys. The dashed line + filled bar mark this entry. Hover or tap any bar for its full count, share, and where it sits relative to this entry.
Source NY Office of Court Administration, Attorney Registration · May 2026
Vanderbilt Univ. Law School's active-bar rate
Of Vanderbilt Univ. Law School's 12 alumni in the New York register, 66.7% currently hold "Currently registered" status, above the statewide average.
Vanderbilt Univ. Law School alumni, active-bar rate
The 2011 admission class today
Of the 9,856 attorneys admitted to the New York bar in 2011, 85.9% are still "Currently registered" today, above the statewide average across all admission years.
Professional Details
- Status
- Currently registered
- Registration Number
- 4921557
- Year Admitted
- 2011 (15 yrs · senior)
- Judicial Department
- 3
- Next Registration
- Apr 2027
Location & Contact
- Company
- Hwabao Trust Co., Ltd.
- City
- Shanghai 200122
- Phone
- 862138506715
Education
Status Distribution Across the New York Bar
Huihua Xi's current status, "Currently registered", places this attorney in the 66.2% of the 429,620-attorney New York register currently marked active.
Full statewide breakdown & source note
Source: NY Office of Court Administration, Attorney Registrations. Status counts reflect the latest reporting cycle. Bar status confirms registration only; it does not imply competence, specialty fit, or freedom from complaints.
Verify This Attorney
Verify on NY Courts Attorney SearchBefore you rely on this record
Huihua Xi's "Currently registered" listing confirms bar standing only, it is a registration fact to verify, not a verdict on quality or competence.
Frequently Asked Questions
Where is Huihua Xi licensed?
Huihua Xi is licensed to practice law in New York.
When was Huihua Xi admitted to the bar?
Huihua Xi was admitted to the bar in 2011.
Where did Huihua Xi go to law school?
Huihua Xi attended VANDERBILT UNIV. LAW SCHOOL.
What company does Huihua Xi work for?
Huihua Xi is associated with Hwabao Trust Co., Ltd. in Shanghai 200122.
Is Huihua Xi in good standing?
Yes, Huihua Xi holds active bar status ("Currently registered").
Sourced from the NY Office of Court Administration, informational only, not legal advice. Full disclosure.
Read our methodology - how this data is sourced, computed, and verified.