New York attorney record · Judicial Dept 3
Jiho Park
Indiana University Robert H. Mckinney Sch. Of Law alumna, admitted to the New York bar in 2015. This record's status, address, and registration history come straight from the NY Office of Court Administration.
- 2015
- Admitted
- 11
- Years in bar
- 5362587
- NY reg #
The record in one line
Admitted in 2015, Jiho Park has built 11 years of active New York practice - more tenure than 24% of the state's currently-active attorneys.
- 11 yrs
- in active practice since admission
- Active
- current bar status: "Currently registered"
- Top 76%
- by tenure among active NY attorneys
- Law school
- Indiana University Robert H. Mckinney Sch. Of Law
Data updated May 2026
What this profile tells you
Bar status & tenure
Bar number 5362587 on the New York register belongs to Jiho Park, currently in active standing. Registration is recorded within Judicial Department 3, the appellate division overseeing this attorney's home district.
Practice context & education
Practice address is listed under Samsung Electro-Mechanics Co., Ltd., located in Suwon-Si Gyeonggi-Do 1667. 3 other attorneys share this firm affiliation in the registry. Educational background: INDIANA UNIVERSITY ROBERT H. MCKINNEY SCH. OF LAW.
State context & due diligence
Jiho Park is currently part of the New York bar's active cohort, a group the breakdown below sizes against the full register.
Experience vs. the active New York bar
11 years into an active New York practice since a 2015 admission, Jiho Park sits here on the statewide experience curve - taller bars hold more attorneys at that experience level.
11 years on the New York bar
Years since admission, all currently-active NY attorneys
11 Top 76% higher than 24% of 284,296 active NY attorneys
Each bar is a band; taller bars hold more active NY attorneys. The dashed line + filled bar mark this entry. Hover or tap any bar for its full count, share, and where it sits relative to this entry.
Source NY Office of Court Administration, Attorney Registration · May 2026
The 2015 admission class today
Of the 8,867 attorneys admitted to the New York bar in 2015, 90.7% are still "Currently registered" today, above the statewide average across all admission years.
Professional Details
- Status
- Currently registered
- Registration Number
- 5362587
- Year Admitted
- 2015 (11 yrs · mid-career)
- Judicial Department
- 3
- Next Registration
- Oct 2027
Location & Contact
- Company
- Samsung Electro-Mechanics Co., Ltd.
- City
- Suwon-Si Gyeonggi-Do 1667
- Phone
- 82-31-210-6534
Education
INDIANA UNIVERSITY ROBERT H. MCKINNEY SCH. OF LAW
Status Distribution Across the New York Bar
Jiho Park's current status, "Currently registered", places this attorney in the 66.2% of the 429,620-attorney New York register currently marked active.
Full statewide breakdown & source note
Source: NY Office of Court Administration, Attorney Registrations. Status counts reflect the latest reporting cycle. Bar status confirms registration only; it does not imply competence, specialty fit, or freedom from complaints.
Other Attorneys at Samsung Electro-Mechanics Co., Ltd.
Verify This Attorney
Verify on NY Courts Attorney SearchBefore you rely on this record
Jiho Park's "Currently registered" listing confirms bar standing only, it is a registration fact to verify, not a verdict on quality or competence.
Frequently Asked Questions
Where is Jiho Park licensed?
Jiho Park is licensed to practice law in New York.
When was Jiho Park admitted to the bar?
Jiho Park has been on the New York bar register since 2015.
Where did Jiho Park go to law school?
Jiho Park attended INDIANA UNIVERSITY ROBERT H. MCKINNEY SCH. OF LAW.
What company does Jiho Park work for?
Jiho Park is associated with Samsung Electro-Mechanics Co., Ltd. in Suwon-Si Gyeonggi-Do 1667.
Is Jiho Park in good standing?
Yes, Jiho Park holds active bar status ("Currently registered").
Sourced from the NY Office of Court Administration, informational only, not legal advice. Full disclosure.
Read our methodology - how this data is sourced, computed, and verified.