New York attorney record · Judicial Dept 3

Lauren Kathleen Podesta

Seton Hall University alumna, admitted to the New York bar in 2004, registered office in Lawrence Township, NJ. This established record's status, address, and registration history come straight from the NY Office of Court Administration.

2004
Admitted
22
Years in bar
4217485
NY reg #

The record in one line

Lauren Kathleen Podesta has held an active New York bar license for 22 years - admitted in 2004, longer-tenured than 51% of the state's currently-active attorneys.

22 yrs
in active practice since admission
Active
current bar status: "Currently registered"
#4 of 6
by tenure in Lawrence Township office peers
Law school
Seton Hall University

Data updated September 2026

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Bar status
Currently registered
active
Year admitted
2004
22 years
Law school
Seton Hall University
Registration
4217485
NY registration #

What this profile tells you

Bar status & tenure

Lauren Kathleen Podesta carries New York bar registration 4217485, an established, active practitioner in good standing. Registration is recorded within Judicial Department 3, the appellate division overseeing this attorney's home district.

Practice context & education

Practice address is listed under Solvay Usa Inc., located in Lawrence Township, NJ, ZIP 08648. Educational background: SETON HALL UNIVERSITY.

State context & due diligence

With an established practice on record, Lauren Kathleen Podesta remains inside the New York bar's active cohort - see below for how that share of the register compares.

Experience vs. the active New York bar

Lauren Kathleen Podesta was admitted in 2004, giving 22 years on the New York register.

22 years on the New York bar

Years since admission, all currently-active NY attorneys

22 Top 49% higher than 51% of 290,787 active NY attorneys

This attorney 0 80 every active NY attorney, bucketed by value

Each bar is a band; taller bars hold more active NY attorneys. The dashed line + filled bar mark this entry. Hover or tap any bar for its full count, share, and where it sits relative to this entry.

Source NY Office of Court Administration, Attorney Registration · September 2026

Tenure among Lawrence Township, NJ office peers

In the small Lawrence Township, NJ cohort (6 with admission years), Lauren Kathleen Podesta ranks #4 by tenure. See the Lawrence Township attorney directory .

Local rank
#4
City cohort
6
Local percentile
50th
Admitted
2004

Nearest tenure peers in Lawrence Township

How local rank is computed

Rank uses years since NY-bar admission among non-deceased registry rows that list the same office city and state, a local placement, not a statewide claim. Source: NY Office of Court Administration Attorney Registration · as of September 2026. Derived local rank, not published upstream.

How Lauren compares to fellow Seton Hall University alumni

Among the 767 Seton Hall University graduates in the New York register, Lauren Kathleen Podesta is longer-tenured than 17%.

22 years vs. Seton Hall University alumni

Years since admission - 767 NY-registered alumni of this school

22 Top 83% higher than 17% of 767 fellow alumni

This attorney 5 40 every registered alum of this school, bucketed by value

Each bar is a band; taller bars hold more fellow alumni. The dashed line + filled bar mark this entry. Hover or tap any bar for its full count, share, and where it sits relative to this entry.

Source NY Office of Court Administration, Attorney Registration · September 2026

The 2004 admission class today

Of the 8,407 attorneys admitted to the New York bar in 2004, 65.2% are still "Currently registered" today, below the statewide average across all admission years.

65%66%67%68% Statewide, all years2004 class 67.2% 65.2% ▼ -3.0%
Bar retention: statewide average vs. the 2004 admission class

Professional Details

Status
Currently registered
Registration Number
4217485
Year Admitted
2004 (22 yrs · senior)
Judicial Department
3
Next Registration
Dec 2026

Location & Contact

Company
Solvay Usa Inc.
ZIP Code
08648
Phone
(609) 917-0976

Education

SETON HALL UNIVERSITY

Status Distribution Across the New York Bar

Lauren Kathleen Podesta's current status, "Currently registered", places this attorney in the 67.2% of the 432,625-attorney New York register currently marked active.

Full statewide breakdown & source note
Cohort Attorneys Share Relevance
Active in good standing 290,787
67.2%
This attorney is in this cohort
Other / inactive / discipline 141,838
32.8%
Verify status before engaging
Total registered 432,625 100.0% Full New York bar register

Source: NY Office of Court Administration, Attorney Registrations. Status counts reflect the latest reporting cycle. Bar status confirms registration only; it does not imply competence, specialty fit, or freedom from complaints.

Nationwide attorneys with similar admission year or city registry density

Out-of-state NY bar peers for Lauren Kathleen Podesta with the closest admission year to 2004. Distinct from same-firm, fellow-alumni, and same-year other-city strips above.

Counts come from the NY State Office of Court Administration registration extract; peers are not a competence or practice-area ranking.

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Before you rely on this record

Lauren Kathleen Podesta's "Currently registered" listing confirms bar standing only, it is a registration fact to verify, not a verdict on quality or competence.

Frequently Asked Questions

Where is Lauren Podesta licensed?

Lauren Podesta is licensed to practice law in New York.

When was Lauren Kathleen Podesta admitted to the bar?

Lauren Kathleen Podesta was admitted to the bar in 2004.

Where did Lauren Kathleen Podesta go to law school?

Lauren Kathleen Podesta attended SETON HALL UNIVERSITY.

What company does Lauren Kathleen Podesta work for?

Lauren Kathleen Podesta is associated with Solvay Usa Inc. in Lawrence Township, NJ.

Is Lauren Kathleen Podesta in good standing?

Yes, Lauren Kathleen Podesta holds active bar status ("Currently registered").

Cite this page & disclosure

Sourced from the NY Office of Court Administration, informational only, not legal advice. Full disclosure.