New York attorney record · Judicial Dept 3
R Daniel Loh Jr
Univ Of Connecticut alumna, admitted to the New York bar in 1984, registered office in Fairfield, CT. A half-lifetime's worth of status, address, and registration history on this record come straight from the NY Office of Court Administration.
- 1984
- Admitted
- 42
- Years in bar
- 1911080
- NY reg #
The record in one line
R Daniel Loh Jr has spent 42 years on the register since admission in 1984, one of the longest-standing active practitioners the state bar carries at 86% tenure percentile.
- 42 yrs
- in active practice since admission
- Active
- current bar status: "Currently registered"
- #26 of 122
- by tenure in Fairfield office peers
- Law school
- Univ Of Connecticut
Data updated September 2026
What this profile tells you
Bar status & tenure
R Daniel Loh Jr has carried New York bar registration 1911080 for the better part of a career, still active and in good standing. Registration is recorded within Judicial Department 3, the appellate division overseeing this attorney's home district.
Practice context & education
Practice address is listed under Robert Daniel Loh Jr., Esq., located in Fairfield, CT, ZIP 06824. Educational background: UNIV OF CONNECTICUT.
State context & due diligence
Across a career spanning 42 years, R Daniel Loh Jr has remained part of the New York bar's active cohort, a share of the register detailed further below.
Experience vs. the active New York bar
R Daniel Loh Jr's 42 years since a 1984 admission places this record near the far edge of the statewide tenure curve below.
42 years on the New York bar
Years since admission, all currently-active NY attorneys
42 Top 14% higher than 86% of 290,787 active NY attorneys
Each bar is a band; taller bars hold more active NY attorneys. The dashed line + filled bar mark this entry. Hover or tap any bar for its full count, share, and where it sits relative to this entry.
Source NY Office of Court Administration, Attorney Registration · September 2026
Tenure among Fairfield, CT office peers
R Daniel Loh Jr is toward the newer end of Fairfield, CT's NY register cohort: #26 of 122 by years since admission. See the Fairfield attorney directory .
- Local rank
- #26
- City cohort
- 122
- Local percentile
- 20th
- Admitted
- 1984
Nearest tenure peers in Fairfield
- Hugh J. Donnelly admitted 1984 · 42 yr
- Linda M. Liefland admitted 1984 · 42 yr
- Neil A. Abrams admitted 1983 · 43 yr
- Victoria Therese Ferrara admitted 1985 · 41 yr
How local rank is computed
Rank uses years since NY-bar admission among non-deceased registry rows that list the same office city and state, a local placement, not a statewide claim. Source: NY Office of Court Administration Attorney Registration · as of September 2026. Derived local rank, not published upstream.
How R compares to fellow Univ Of Connecticut alumni
Among the 102 Univ Of Connecticut graduates in the New York register, R Daniel Loh Jr is longer-tenured than 75%.
42 years vs. Univ Of Connecticut alumni
Years since admission - 102 NY-registered alumni of this school
42 Top 25% higher than 75% of 102 fellow alumni
Each bar is a band; taller bars hold more fellow alumni. The dashed line + filled bar mark this entry. Hover or tap any bar for its full count, share, and where it sits relative to this entry.
Source NY Office of Court Administration, Attorney Registration · September 2026
The 1984 admission class today
Of the 5,952 attorneys admitted to the New York bar in 1984, 54.8% are still "Currently registered" today, below the statewide average across all admission years.
Professional Details
- Status
- Currently registered
- Registration Number
- 1911080
- Year Admitted
- 1984 (42 yrs · veteran)
- Judicial Department
- 3
- Next Registration
- Feb 2028
Location & Contact
- Company
- Robert Daniel Loh Jr., Esq.
- City
- Fairfield, CT
- ZIP Code
- 06824
- Phone
- (203) 259-3994
Education
UNIV OF CONNECTICUT
Status Distribution Across the New York Bar
R Daniel Loh Jr's current status, "Currently registered", places this attorney in the 67.2% of the 432,625-attorney New York register currently marked active.
Full statewide breakdown & source note
Source: NY Office of Court Administration, Attorney Registrations. Status counts reflect the latest reporting cycle. Bar status confirms registration only; it does not imply competence, specialty fit, or freedom from complaints.
Near-tenure Univ Of Connecticut alumni
Fellow alumni on the NY register whose admission year is closest to 1984 (excluding same-firm colleagues above).
Same admission year (1984), other cities
NY-registered attorneys admitted in 1984 whose listed office city differs from Fairfield, a vintage cohort, not a neighborhood list.
Nationwide attorneys with similar admission year or city registry density
Two non-geo peer axes for R Daniel Loh Jr: closest NY bar admission year outside CT, and closest out-of-state office cities by how many NY-registered attorneys they list (~123 here). Distinct from same-firm, fellow-alumni, and same-year other-city strips above.
Similar admission year (~1984)
Counts come from the NY State Office of Court Administration registration extract; peers are not a competence or practice-area ranking.
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Compare attorneys →Before you rely on this record
R Daniel Loh Jr's "Currently registered" listing confirms bar standing only, it is a registration fact to verify, not a verdict on quality or competence.
Frequently Asked Questions
Where is R Loh licensed?
R Loh is licensed to practice law in New York.
When was R Daniel Loh Jr admitted to the bar?
R Daniel Loh Jr's admission to the New York bar dates back to 1984.
Where did R Daniel Loh Jr go to law school?
R Daniel Loh Jr attended UNIV OF CONNECTICUT.
What company does R Daniel Loh Jr work for?
R Daniel Loh Jr is associated with Robert Daniel Loh Jr., Esq. in Fairfield, CT.
Is R Daniel Loh Jr in good standing?
Yes, R Daniel Loh Jr holds active bar status ("Currently registered").
Cite this page & disclosure
Sourced from the NY Office of Court Administration, informational only, not legal advice. Full disclosure.
Read our methodology - how this data is sourced, computed, and verified.